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Hexafluorozirconic acid (HFZA) is an inorganic compound that exists in two forms: a solid and a liquid.
Hexafluorozirconic acid (HFZA) is primarily used as a catalyst in the synthesis of organic compounds, as a reagent in the synthesis of fluorinated compounds, and as a reagent for the production of fluorinated polymers.
Hexafluorozirconic acid (HFZA) is an inorganic compound with the chemical formula F6HZr-.
CAS Number: 12021-95-3
Molecular Formula: F6HZr-
Molecular Weight: 206.22
EINECS Number: 234-666-0
Hexafluorozirconic acid (HFZA) is a highly reactive compound that is used in a variety of scientific and industrial applications.
Hexafluorozirconic acid (HFZA) is also used in the manufacture of semiconductor materials and in the production of high-strength glass.
Aqueous solutions of Hexafluorozirconic acid (HFZA) consist of salts of the cation and hexafluorosilicate anion.
These salts and their aqueous solutions are colorless.
Hexafluorozirconic acid (HFZA) is produced naturally on a large scale in volcanoes.
Hexafluorozirconic acid (HFZA) is manufactured as a coproduct in the production of phosphate fertilizers.
The resulting hexafluorosilicic acid is almost exclusively consumed as a precursor to aluminum trifluoride and synthetic cryolite, which are used in aluminium processing.
Salts derived from Hexafluorozirconic acid (HFZA) are called hexafluorosilicates.
Hexafluorozirconic acid (HFZA) is an inorganic acid composed of H2 [ZrF6], transition metal zirconium and halogen fluorine.
Hexafluorozirconic acid (HFZA)s salts are hexafluorozirconates.
Hexafluorozirconic acid (HFZA) is used in articles, by professional workers (widespread uses), in formulation or re-packing, at industrial sites and in manufacturing.
Hexafluorozirconic acid (HFZA), H 2 [ZrF 6 ], is an inorganic acid consisting of the transition metal zirconium and the halogen fluorine.
Their salts are the hexafluorozirconates.
The acid and its salts are used in metal surface technology.
A 45% aqueous solution of Hexafluorozirconic acid (HFZA) is an odorless, colorless liquid.
Hexafluorozirconic acid (HFZA) has a density of 1.51 g · cm −3 .The pH value is <1 at 20 ° C.
An inorganic compound aqueous solution used mainly used in manufacturing of optical glass and fluozirconate,in the metal industry as corrosion inhibitor for surface pre-treatment.
Hexafluorozirconic acid (HFZA) is most effective on aluminum, but can also used on other metals.
Hexafluorozirconic acid, often represented as HFZA, is a chemical compound with the molecular formula H2ZrF6.
Hexafluorozirconic acid (HFZA) is a strong and corrosive inorganic acid that contains zirconium and fluorine.
Hexafluorozirconic acid (HFZA) is derived from zirconium, which is a chemical element with the atomic number 40 and the symbol Zr.
Hexafluorozirconic acid (HFZA) Solution has multiple uses in inorganic chemical reactions such as the preparation of titanium oxide photocatalysts and zirconium oxide thin films.
American Elements can produce most materials in high purity and ultra high purity (up to 99.99999%) forms and follows applicable ASTM testing standards; a range of grades are available including Mil Spec (military grade), ACS, Reagent and Technical Grade, Food, Agricultural and Pharmaceutical Grade, Optical Grade, USP and EP/BP (European Pharmacopoeia/British Pharmacopoeia).
Hexafluorozirconic acid (HFZA) has been crystallized as various hydrates.
These include (H5O2)2SiF6, the more complicated (H5O2)2SiF6·2H2O, and (H5O2)(H7O3)SiF6·4.5H2O.
In all of these salts, the octahedral hexafluorosilicate anion is hydrogen bonded to the cations.
Hexafluorozirconic acid (HFZA) is mainly used as a corrosion inhibitor by customers operating in the metal and plating industry.
Although it can be used on other metals, it shows the highest efficiency on aluminum.
Customers are using Hexafluorozirconic acid (HFZA) as an alternative to nickel-based products with less hazardous properties when it comes to environmental and health and safety regulations.
Hexafluorozirconic acid (HFZA) applications include electroplating, aluminum varnishing in chromiumfree processes, synthesis of fluoride-releasing dental monomers as the precursor to ZrO2 ceramic films, and metal.
Hexafluorozirconic acid (HFZA) reduces sludge formation as a by-product - eg. In zinc phosphate based systems. A new phosphate-free pretreatment from Henkel Corp.
The treatment bath is composed of dilute Hexafluorozirconic acid (HFZA) with small quantities of non-hazardous components containing Si and Cu.
The performance of treated steel was compared to samples treated in a phosphate conversion coating bath, in simple Hexafluorozirconic acid (HFZA) and in TecTalis without the addition of the Cu containing component.
Atomic Force Microscopy (AFM) and Transmission Electron Microscopy (TEM) were used to characterize the coating surface morphology, structure and composition.
A Quartz Crystal Microbalance (QCM) was used for studying film growth kinetics on thin films of pure Fe, Al and Zn.
Electrochemical Impedance Spectroscopy (EIS) was performed on treated and painted steel for studying long-term corrosion performance of the coatings.
The phosphate-free coating provided long-term corrosion performance comparable to that of phosphate conversion coatings.
The coatings uniformly cover the surface in the form of 10-20 nm sized nodules and clusters of these
features up to 500 nm in size.
The coatings are usually about 20-30 nm thick and are mostly composed of Zr and O with enrichment of copper at randomly distributed locations and clusters.
Hexafluorozirconic acid (HFZA) is composed of zirconium, fluorine, and hydrogen atoms.
Hexafluorozirconic acid (HFZA) is a zirconium salt of hydrofluoric acid (HF).
Hexafluorozirconic acid (HFZA) is a strong acid, and it is highly corrosive.
Hexafluorozirconic acid (HFZA) has the ability to donate protons (H+) in aqueous solutions, making it acidic.
Hexafluorozirconic acid (HFZA) has various applications, primarily in the field of chemistry and industry.
Hexafluorozirconic acid (HFZA) is used in processes like etching, electroplating, and surface treatment of metals.
Hexafluorozirconic acid (HFZA) is also employed in the preparation of other zirconium compounds.
Due to its corrosive nature and potential health hazards, Hexafluorozirconic acid (HFZA) should be handled with care.
Proper protective equipment, including gloves and eye protection, should be worn when working with this acid.
Adequate ventilation is necessary to prevent inhalation of fumes.
The disposal of hexafluorozirconic acid and waste containing it should follow local regulations and guidelines to prevent environmental contamination.
Hexafluorozirconic acid (HFZA), 45%, CAS 12021-95-3, (also known as hexafluorozirconic acid or Hexafluorozirconic acid) has the formula H2ZrF6.
Hexafluorozirconic acid (HFZA) is a corrosive chemical, like all salts of Hexafluorozirconic acid.
Hexafluorozirconic acid finds use in zirconium oxide thin films for aluminum annodizing, in surface treatment applications, electroplating, and in chrome-free aluminum lacquering processes.
For metal treatment processes, Hexafluorozirconic acid (HFZA) and Fluorotitanic acid are often used together in the plating system.
Other release to the environment of Hexafluorozirconic acid (HFZA) is likely to occur from: outdoor use in long-life materials with low release rate (e.g. metal, wooden and plastic construction and building materials) and indoor use in long-life materials with low release rate (e.g. flooring, furniture, toys, construction materials, curtains, foot-wear, leather products, paper and cardboard products, electronic equipment).
Hexafluorozirconic acid (HFZA) can be found in products with material based on: metal (e.g. cutlery, pots, toys, jewellery).
Hexafluorozirconic acid (HFZA) has multiple uses in inorganic chemical reactions such as titanium oxide photocatalysts and the preparation of zirconium oxide thin films.
American Elements can manufacture most materials in high purity and ultra-high purity (up to 99.99999%) forms and conforms to current ASTM test standards; A range of grades are available.
The Hexafluorozirconic acid (HFZA) is an organic compound with the formula H2ZrF6.
The analysis is provided for the Hexafluorozirconic acid (HFZA) international market including development history, Hexafluorozirconic Acid industry competitive landscape analysis.
The composition also comprises hexafluorozirconic acid or salts thereof.
Hexafluorozirconic acid (HFZA) can be synthesized in a number of ways, including the reaction of zirconium dioxide with hydrogen fluoride, the reaction of zirconium oxychloride with hydrofluoric acid, and the reaction of zirconium tetrachloride with hydrofluoric acid.
The reaction of zirconium dioxide with hydrogen fluoride is the most commonly used method of synthesis.
In this method, zirconium dioxide is reacted with hydrogen fluoride in an aqueous solution at a temperature of approximately 70°C.
The reaction produces Hexafluorozirconic acid (HFZA), which is then isolated and purified by distillation.
Hexafluorozirconic acid (HFZA) is produced commercially from fluoride-containing minerals that also contain silicates.
Specifically, apatite and fluorapatite are treated with sulfuric acid to give phosphoric acid, a precursor to several water-soluble fertilizers.
This is called the wet phosphoric acid process.
As a by-product, approximately 50 kg of Hexafluorozirconic acid (HFZA) is produced per tonne of HF owing to reactions involving silica-containing mineral impurities.
Some of the hydrogen fluoride (HF) produced during this process in turn reacts with silicon dioxide (SiO2) impurities, which are unavoidable constituents of the mineral feedstock, to give silicon tetrafluoride.
Thus formed, the silicon tetrafluoride reacts further with HF.
6 HF + SiO2 → SiF2-6 + 2 H3O+
Hexafluorozirconic acid (HFZA) can also be produced by treating silicon tetrafluoride with hydrofluoric acid.
In water, Hexafluorozirconic acid (HFZA) readily hydrolyzes to hydrofluoric acid and various forms of amorphous and hydrated silica ("SiO2").
At the concentration usually used for water fluoridation, 99% hydrolysis occurs and the pH drops.
The rate of hydrolysis increases with pH.
At the pH of drinking water, the degree of hydrolysis is essentially 100%.
H2SiF6 + 2 H2O → 6 HF + "SiO2"
Near neutral pH, hexafluorosilicate salts hydrolyze rapidly according to this equation:
SiF2−6 + 2 H2O → 6 F− + SiO2 + 4 H+
Boiling point: 100℃[at 101 325 Pa]
Density: 1.512 g/mL at 25 °C
solubility: Miscible with acid-base solutions.
form: Liquid
Exposure limits ACGIH: TWA 5 mg/m3; STEL 10 mg/m3
NIOSH: IDLH 25 mg/m3; TWA 5 mg/m3; STEL 10 mg/m3
Stability: Stable. Incompatible with acids, oxidizing agents. Contact with acids releases hydrogen fluoride.
Hexafluorozirconic acid (HFZA) is used in a variety of scientific research applications, including the synthesis of organic compounds, the synthesis of fluorinated compounds, and the production of fluorinated polymers.
Hexafluorozirconic acid (HFZA) is also used in the production of semiconductor materials and in the manufacture of high-strength glass.
In addition, Hexafluorozirconic acid (HFZA) is used as a reagent in the synthesis of organometallic compounds and in the production of high-performance polymers.
The mechanism of action of Hexafluorozirconic acid (HFZA) is not fully understood.
It is believed that Hexafluorozirconic acid (HFZA) acts as a Lewis acid, which means that it can form a bond with an electron-rich species, such as a Lewis base.
This bond can then be used to catalyze the formation of a new bond between two molecules.
Hexafluorozirconic acid (HFZA) can act as a nucleophile, which means that it can react with electron-deficient species, such as electrophiles.
The biochemical and physiological effects of Hexafluorozirconic acid (HFZA) are not well understood.
However, it is believed that Hexafluorozirconic acid (HFZA) can act as a Lewis acid, which means that it can form a bond with an electron-rich species, such as a Lewis base.
This bond can then be used to catalyze the formation of a new bond between two molecules.
Additionally, Hexafluorozirconic acid (HFZA) can act as a nucleophile, which means that it can react with electron-deficient species, such as electrophiles.
One of the main advantages of using Hexafluorozirconic acid (HFZA) in laboratory experiments is its high reactivity.
This makes it an ideal reagent for the synthesis of organic compounds and the production of fluorinated polymers.
Additionally, Hexafluorozirconic acid (HFZA) is relatively inexpensive and readily available.
Hexafluorozirconic acid (HFZA) can be hazardous to work with and should only be used in a well-ventilated area.
Hexafluorozirconic acid (HFZA) can react with water and other compounds, so it should be handled with care.
There are a number of potential future directions for the use of Hexafluorozirconic acid in scientific research.
One potential application is the use of Hexafluorozirconic acid (HFZA) in the synthesis of new materials, such as high-performance polymers and semiconductor materials.
Additionally, Hexafluorozirconic acid (HFZA) could be used in the synthesis of new organic compounds, such as pharmaceuticals and agrochemicals.
Finally, Hexafluorozirconic acid (HFZA) could be used to develop new catalysts for the synthesis of organic compounds and the production of fluorinated polymers.
Hexafluorozirconic acid (HFZA) is often used for etching and surface treatment of metals, especially in the electronics and semiconductor industry.
Hexafluorozirconic acid (HFZA) is employed to prepare surfaces for subsequent processes such as adhesion and soldering.
Hexafluorozirconic acid (HFZA) is used as an additive in metal plating baths.
Hexafluorozirconic acid (HFZA) can assist in achieving uniform and corrosion-resistant metal coatings.
Zirconium compounds, including those derived from Hexafluorozirconic acid (HFZA), can have catalytic properties and are used in various chemical processes.
Hexafluorozirconic acid (HFZA) is a source of zirconium in the form of zirconium salts.
These salts are used in the production of various zirconium compounds and materials for specialized applications.
Hexafluorozirconic acid (HFZA) should be handled with caution.
When working with Hexafluorozirconic acid (HFZA), safety measures should include using appropriate personal protective equipment (PPE), working in a well-ventilated area, and following safety protocols to prevent skin contact and inhalation of fumes.
Hexafluorozirconic acid (HFZA) can be used in the synthesis of other chemical compounds.
Hexafluorozirconic acid (HFZA)s strong acidity makes it useful in various chemical reactions where highly acidic conditions are required.
In research and chemical laboratories, Hexafluorozirconic acid (HFZA) may be used for specific experiments and chemical processes, particularly when zirconium or fluoride chemistry is involved.
Uses Of Hexafluorozirconic acid (HFZA):
Hexafluorozirconic acid is mainly used in manufacturing of optical glass and fluozirconate.
Another use of low thermal conductivity is a ceramic fiber insulation for crystal growth furnaces, fuel cell stack insulation and infrared heating systems.
This material is also used in dentistry for dental restorations such as crowns and bridges coated with traditional feldspathic porcelain for aesthetic reasons or made entirely of monolithic zirconia.
Hexafluorozirconic acid (HFZA) is used in the manufacture of sub-frames for the construction of strong, extremely durable dental prostheses.
Zirconia stabilized with yttria (yttrium oxide), known as zirconia stabilized with yttria, can be used as a strong base material in some all-ceramic crown restorations.
Transform hardened zirconia is used in making ceramic knives.
Due to its hardness, ceramic edged cutlery stays sharp longer than steel edged products.
Hexafluorozirconic acid (HFZA) was used as a component of sticks to be the center of attention due to its infusibility and brilliant shine in incandescent state.
Other release to the environment of Hexafluorozirconic acid (HFZA) is likely to occur from: indoor use (e.g. machine wash liquids/detergents, automotive care products, paints and coating or adhesives, fragrances and air fresheners) and outdoor use resulting in inclusion into or onto a materials (e.g.binding agent in paints and coatings or adhesives).
Hexafluorozirconic acid (HFZA) Solution has many uses in inorganic chemical reactions such as the preparation of titanium oxide photocatalysts and zirconium oxide thin films.
Hexafluorozirconic acid (HFZA) is commonly employed for etching and surface treatment of metals, particularly in the electronics and semiconductor industry.
Hexafluorozirconic acid (HFZA) can remove oxides and contaminants from metal surfaces, preparing them for subsequent processes like soldering and adhesion.
Hexafluorozirconic acid (HFZA)is used as an additive in metal plating baths.
Hexafluorozirconic acid (HFZA) assists in achieving uniform and corrosion-resistant metal coatings, enhancing the quality and durability of plated items.
In the electronics industry, HFZA is used for cleaning and surface preparation of semiconductor wafers and other electronic components.
Hexafluorozirconic acid (HFZA) plays a crucial role in ensuring the quality and performance of microelectronics.
Certain zirconium compounds derived from HFZA have catalytic properties and are used in various chemical reactions and industrial processes.
Hexafluorozirconic acid (HFZA) is a source of zirconium, a valuable element in the production of various zirconium compounds, including zirconium oxide, zirconium sulfate, and zirconium acetate.
Hexafluorozirconic acid (HFZA)s have applications in diverse fields, such as ceramics, catalysts, and fuel cell technology.
Hexafluorozirconic acid (HFZA) is used in chemical synthesis processes, particularly those involving zirconium chemistry.
Hexafluorozirconic acid (HFZA) provides a source of zirconium ions and fluoride ions for various reactions.
Hexafluorozirconic acid (HFZA) may find use in chemical research and laboratory settings, where its highly acidic properties can be utilized for specific experiments and chemical reactions.
Hexafluorozirconic acid (HFZA) can be used in the treatment of certain types of waste, particularly in industries where waste contains metal contaminants.
Zirconium is an important component in nuclear reactor fuel rods, and compounds derived from Hexafluorozirconic acid (HFZA) can be involved in the nuclear fuel production process.
Hexafluorozirconic acid (HFZA), are used in the production of high-temperature ceramics and specialty glasses for applications like nuclear waste containment and high-performance optics.
Hexafluorozirconic acid (HFZA) is used in the production of optical coatings for glass, including anti-reflective coatings on eyeglasses, camera lenses, and optical instruments.
These coatings reduce glare and improve light transmission.
Hexafluorozirconic acid (HFZA) compounds are employed in dentistry for dental ceramics and prosthetic materials.
They contribute to the strength and durability of dental restorations, such as crowns and bridges.
Hexafluorozirconic acid (HFZA), is used as a refractory material in high-temperature applications, such as kiln linings and furnace crucibles.
Hexafluorozirconic acid (HFZA) is also used in the manufacturing of ceramic knives and bearings.
Hexafluorozirconic acid (HFZA)s are used in solid oxide fuel cells, where they act as electrolytes that allow the efficient conduction of oxygen ions.
Hexafluorozirconic acid (HFZA) can be used in welding and brazing processes as a flux to aid in metal joining and improve the quality of the weld or joint.
Hexafluorozirconic acid (HFZA) is used for chemical polishing and planarization processes, ensuring a smooth and even surface on semiconductor wafers.
Hexafluorozirconic acid (HFZA), are used in oil and gas exploration and production equipment due to their resistance to corrosion in harsh environments.
Hexafluorozirconic acid (HFZA) has historical use in photographic chemicals for developing and fixing photos.
While this application has largely been replaced by digital photography, it was once a common use.
In the plastics industry, zirconium compounds derived from Hexafluorozirconic acid (HFZA) can be used as catalysts for polymerization reactions.
Hexafluorozirconic acid (HFZA)s are used in control rods in nuclear reactors to absorb neutrons and control the rate of nuclear fission.
Hexafluorozirconic acid (HFZA)s are employed as pigments in ceramics, providing colors and glaze effects.
Hexafluorozirconic acid (HFZA) can be used in the synthesis of zirconium dioxide nanoparticles for a range of applications, including catalysis and materials science.
Hexafluorozirconic acid (HFZA)can be used for metal extraction and purification processes.
Safety Profile Of Hexafluorozirconic acid (HFZA):
Hexafluorozirconic acid (HFZA) is extremely corrosive and can cause severe burns and tissue damage upon contact with the skin, eyes, or mucous membranes.
Hexafluorozirconic acid (HFZA) can also corrode and damage equipment and materials.
Hexafluorozirconic acid (HFZA) fumes or mists can lead to severe respiratory irritation, including throat and lung damage.
Hexafluorozirconic acid (HFZA) vapor or aerosol can result in a condition known as "metal fume fever."
Hexafluorozirconic acid (HFZA) can lead to immediate symptoms such as coughing, difficulty breathing, eye and skin burns, and severe pain.
In severe cases, it can result in lung inflammation, tissue necrosis, and organ damage.
Prolonged or repeated exposure to Hexafluorozirconic acid (HFZA) may lead to chronic health effects, including lung and respiratory problems.
Spills or releases of Hexafluorozirconic acid (HFZA) into the environment can contaminate soil and water, posing risks to aquatic life and ecosystems.
Hexafluorozirconic acid (HFZA) can react violently with certain materials, such as water, alcohols, and strong bases, producing hazardous by-products.
Synonyms Of Hexafluorozirconic acid (HFZA) :
Hexafluorozirconic acid
tetrafluorozirconium;dihydrofluoride
Zirconate(2-), hexafluoro-, dihydrogen, (OC-6-11)-
Hexafluorzirkonsaurelosung
AKOS015903617
zirconium(IV) fluoride dihydrofluoride
FT-0627006
J-521444
Q62018152
